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Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS

Yang, Jixin, Hyde, Jason R, Wilson, James W, Mallik, Kanad, Sazio, Pier, Brien, Paul, Malik, Mohamed A, Afzaal, Mohammad, Nguyen, Chinh Q, George, Michael W, Howdle, Steven M and Smith, David C (2009) Continuous flow supercritical chemical fluid deposition of optoelectronic quality CdS.

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Abstract

Supercritical chemical fluid deposition (SCFD) has been shown to have remarkable advantages for deposition inside nanostructured templates however so far the technique has mostly been used to deposit metals. In this paper we present the SCFD of optoelectronic grade CdS. The quality of this material is demonstrated by a range of techniques including reflectivity (A) and photoluminescence spectroscopy (B and C). At 4 K the bandedge luminescence has a full-width-at-half-maximum linewidth of 30 meV comparable with that of single crystal CdS.

Item Type: Article
Additional Information: Metadata only available from this repository. © 2009 Wiley Publishing.This article was originally published in the Journal of Advanced Materials in 2009, by Wiley. The definitive version is available at http://dx.doi.org/10.1002/adma.200803751
Keywords: CdS chalcogenide, continuous flow, semiconductors, supercritical fluids
Divisions: ?? GlyndwrUniversity ??
Depositing User: ULCC Admin
Date Deposited: 05 Oct 2011 09:13
Last Modified: 11 Dec 2017 20:05
URI: http://glyndwr.collections.crest.ac.uk/id/eprint/107

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